Carbon film is sputter deposited in a nitrogen-containing gas and then vacuum heat treated

摘要

A carbon film is produced by sputter deposition in a nitrogen-containing sputtering gas mixture, followed by vacuum heat treatment. A carbon film is produced on a substrate by sputter deposition from a carbon target in a sputtering gas mixture containing /-20% nitrogen, followed by heat treatment at above 100 deg C under high vacuum. An Independent claim is also included for a substrate with a carbon film produced by the above process. Preferred Features: The carbon film may have a structure of perpendicular fibers and/or tubes of 1-30 nm diameter.