发明名称 EXPOSURE SYSTEM, METHOD OF MANUFACTURE THEREOF, METHOD OF WAFER TRANSFER, DEVICE AND METHOD OF MANUFACTURE DEVICE
摘要 <p>There are provided wafer stages (WST) for supporting wafers (W) and a transfer system (100) for transferring wafers to the wafer stages. The wafer transfer system comprises a turntable (42) for carrying a wafer in the direction of X and a control system having sensors (48) to check for the deviation in position of the wafer (W) that rotates together with the turntable (42) while moving in the direction of X. Since the detection of deviation of the wafer is completed within the period of transfer, throughput improves, and no extra space for the detection of deviation is required, resulting in effective use of space. This also reduces the manufacturing cost of devices such as semiconductor devices.</p>
申请公布号 WO2000002239(P1) 申请公布日期 2000.01.13
申请号 JP1999003565 申请日期 1999.07.02
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