Verfahren und Vorrichtung zur Tauchbehandlung von Halbleitern und anderen Einrichtungen

摘要

Method and apparatus (10) for cleaning semiconductor devices (22) and other workpieces using an aqueous rinse solution which is deoxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber (26) is also disclosed for carrying out the cleaning method.