发明名称 Semiconductor device and method of forming the same
摘要 <p>The present invention provides a cavity structure formed in a semiconductor substrate and under a passive device formation region on which a passive device is formed, wherein the cavity structure has at least one of supporting pillars and supporting walls for providing the passive device formation region with a mechanical strength. &lt;IMAGE&gt;</p>
申请公布号 EP0971413(A2) 申请公布日期 2000.01.12
申请号 EP19990107104 申请日期 1999.04.12
申请人 NEC CORPORATION 发明人 YOSHIDA, HIROSHI
分类号 H01L21/822;H01L21/02;H01L27/04;(IPC1-7):H01L27/00 主分类号 H01L21/822
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