| 摘要 |
PROBLEM TO BE SOLVED: To obtain a coating liquid having a leveling capacity sufficient to cope with the integration and elaboration of semiconductor devices by dissolving a nitrogenous compound having at least one amino group substituted with at least either a hydroxyalkyl or an alkoxyalkyl in an organic solvent. SOLUTION: The nitrogenous compound is the one having, at least one, usually, one to three substituted amino groups and optionally having other substituents. The nitrogenous compound is desirably a triazine compound, particularly, methoxymethylated benzoguanamine. The organic solvent is particularly desirably an alkylene glycol monoalkyl ether or an ester thereof. For instance, this liquid is applied to a silicon wafer having a circuit pattern of a metal such as aluminum, dried, and baked at 150-250 deg.C for, usually, 1-30 min to form a leveling film. |
