发明名称 |
PRODUCTION OF POROUS INORGANIC FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a process for easily producing a porous inorganic film having high characteristics and uniform pore size using an alkoxysilane solution as a main agent even in a case that the solution contains other metallic materials. SOLUTION: This production process comprises a coating film formation process to apply an inorganic material composition composed mainly of an alkoxysilane solution containing water and a catalytic amount of an acid, incorporated with a metal salt soluble in the solvent of the solution and having a molar ratio of water to an alkoxysilane (H2O/Si) of <=4 and a pH of 1-2.5 to a porous inorganic substrate and dry the applied composition to form an amorphous coating film and a heating process to heat the amorphous coating film under a low-temperature normal-pressure condition not to cause the crystallization of the film by hydrolysis.
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申请公布号 |
JP2000007306(A) |
申请公布日期 |
2000.01.11 |
申请号 |
JP19980172585 |
申请日期 |
1998.06.19 |
申请人 |
KUBOTA CORP |
发明人 |
SHIN YOSHIYUKI;ONISHI TAKAAKI;OSADA KAZUO |
分类号 |
C01B13/32;(IPC1-7):C01B13/32 |
主分类号 |
C01B13/32 |
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