发明名称 PRODUCTION OF POROUS INORGANIC FILM
摘要 PROBLEM TO BE SOLVED: To provide a process for easily producing a porous inorganic film having high characteristics and uniform pore size using an alkoxysilane solution as a main agent even in a case that the solution contains other metallic materials. SOLUTION: This production process comprises a coating film formation process to apply an inorganic material composition composed mainly of an alkoxysilane solution containing water and a catalytic amount of an acid, incorporated with a metal salt soluble in the solvent of the solution and having a molar ratio of water to an alkoxysilane (H2O/Si) of <=4 and a pH of 1-2.5 to a porous inorganic substrate and dry the applied composition to form an amorphous coating film and a heating process to heat the amorphous coating film under a low-temperature normal-pressure condition not to cause the crystallization of the film by hydrolysis.
申请公布号 JP2000007306(A) 申请公布日期 2000.01.11
申请号 JP19980172585 申请日期 1998.06.19
申请人 KUBOTA CORP 发明人 SHIN YOSHIYUKI;ONISHI TAKAAKI;OSADA KAZUO
分类号 C01B13/32;(IPC1-7):C01B13/32 主分类号 C01B13/32
代理机构 代理人
主权项
地址