| 摘要 |
PROBLEM TO BE SOLVED: To form a thin film by simple feeding equipment capable of continuously feeding a liq. evaporating material into a film forming vacuum tank and small in the restriction of the evaporating material to be treated by feeding a liq. evaporating raw material into an evaporating vaporizer in a film forming vacuum tank from the outside of the film forming vacuum tank through a capillary under pressure as it is in a liq. state, vaporizing and evaporating it in the evaporating vaporizer and depositing a thin film on a substrate. SOLUTION: A liq. evaporating raw material in a liq. raw material storage tank 51 is deaerated by a deaerator 53, is passed through a capillary 63 for feeding and is continuously fed from a nozzle 65 to an evaporating vaporizer 31 by a certain amt. by a liq. feeding pump 55. Since the feeding system of the liq. evaporating raw material into the film forming vacuum tank 11 is usable at an ordinary temp. on the outside of the film forming vacuum tank 11, restriction is small, and, as a valve or the like, ordinary ones can be used. Since the liq. evaporating raw material is heated in the evaporating vaporizer, the one having a high boiling point can be treated, and the degree of freedom is high. Moreover, since the continuous feed from the outside is easy, it is suitable for the continuation of the device.
|
