| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holder with a structure eliminating the undesirable influence on the adjacent other film forming face, at the time of film formation to a specified film forming face. SOLUTION: A film forming substrate 10 to be film-formed has film forming faces 12a and 12b adjacent via a ridgeline 11. The film forming substrate 10 is held by a substrate holder 13, and film formation is executed. The substrate holder 13 is provided with a main body holding the film forming substrate 10 and a mask 15a partitioning the film forming face along the ridgeline 11 of the adjacent film forming faces. Since the mask 15a screens the vapor depositing flow, there is no detour into the other film forming face 12c, and the exertion of undesirable influence on the optical characteristics of the other film forming face 12c is eliminated. |
