METHOD FOR FORMING FUNCTIONAL INORGANIC COATING FILM

摘要

PROBLEM TO BE SOLVED: To obtain a functional inorganic coating film having excellent wear resistance and adhesion and a surface hard to be damaged by forming a photosemiconductor particles layer on the surface of a glass substrate, before a silicon layer having at least a predetermined tetrafunctional silicon unit is formed in the gap. SOLUTION: A functional inorganic coating film is formed such that a photosemiconductor particles layer and a silicon layer are formed in order. Irradiation of ultraviolet rays to the photosemiconductor causes active oxygen, so that the organic material is oxidized and decomposed. The silicon coating material used for forming the silicon layer contains a silicon resin having at least tetrafunctional silicon unit shown by a formula, and is the hydrolysis polycondensate of a mixture containing 0-10 mol. silicon compd. expressed by R2Si(OR1)3 and 0-0.6 mol. silicon compd. expressed by R22Si(OR1)2, with respect to 1 mol. silicon compd. expressed by Si(OR1)4 (R1, R2 denote univalent hydrocarbon groups).