发明名称 SUBSTRATE HANDLING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate handling method which can prevent particles effectively from adhering to the back surface of a substrate, and restrain stress applied to the substrate at the time of suction by a vacuum chuck. SOLUTION: A means having a plurality of small holes 22 almost evenly dispersed in the plane of a perforated plate 20 of conductive material, which is electrically-grounded, is fitted to the suction part of a vacuum chuck 10a attractively-retaining a substrata 2. The section of the perforated plate 20 is evacuated even in any case other than where the substrate 2 is sucked.</p>
申请公布号 JP2000006072(A) 申请公布日期 2000.01.11
申请号 JP19980188164 申请日期 1998.06.18
申请人 NISSIN ELECTRIC CO LTD 发明人 YUASA SATOSHI
分类号 B65G49/07;B25J15/06;C23C14/00;C23C14/50;C23C16/44;H01J37/20;H01J37/317;H01L21/677;H01L21/68;(IPC1-7):B25J15/06 主分类号 B65G49/07
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