发明名称 |
Method of controlling illumination field to reduce line width variation |
摘要 |
Blades pivotally attached together linked to push rods and inserted into an illumination field, energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The blades controllably adjust the width of the rectangular illumination field to modify the illumination intensity or energy provided to a photosensitive substrate. The illumination field is scanned across the photosensitive substrate to expose it with the image of a reticle. The blades are dynamically controlled during the scanning exposure to adjust the illumination intensity or energy in a predetermined way. The resulting selective change in exposure dose corrects local area of line width variance. Various errors in pattern reproduction using a photolithographic system are relatively easily corrected. This is particularly advantageous in a scanning lithography system used in the manufacture of semiconductors.
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申请公布号 |
US6013401(A) |
申请公布日期 |
2000.01.11 |
申请号 |
US19990232758 |
申请日期 |
1999.01.15 |
申请人 |
SVG LITHOGRAPHY SYSTEMS, INC. |
发明人 |
MCCULLOUGH, ANDREW W.;GOVIL, PRADEEP K.;GALBURT, DANIEL N.;CALLAN, DAVID |
分类号 |
G02B26/02;G03F7/20;G03F7/23;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G02B26/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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