发明名称 METHOD AND DEVICE FOR PRODUCING MINUTE PATTERN
摘要 PROBLEM TO BE SOLVED: To directly plot a fine pattern not producible with optical working, particularly a conductive patter on a substrate to stably obtain it at a high speed by decomposing a material gas with an irradiation light irradiated from a minute opening arranged to an optical probe in an optical chemical reaction, and forming the fine pattern while supplying its decomposed products onto the substrate. SOLUTION: An introducing light 4 is introduced into the optical probe 1 from a light source 3. The introduced light 4 is set to on/off as required, is propagated in the optical probe 1 made of an optical fiber and projected from the minute opening 5 arranged to a light shielding layer 2 of a sharpened core tip part as the irradiation light 6. A diameter of the minute opening 5 is smaller than a wave length of the introduced light, the irradiation light 6 is made to an evanescent light. A raw material gas 8 supplied from a fine tube is decomposed in the optical chemical reaction by the irradiation light 6, its decomposed products are supplied to a desired pattern of the substrate 9 surface to be stuck, thus the fine pattern 13 is formed.
申请公布号 JP2000008166(A) 申请公布日期 2000.01.11
申请号 JP19980193791 申请日期 1998.06.24
申请人 CANON INC 发明人 KAWASAKI TAKEHIKO;SHIMADA YASUHIRO;YANO KYOJI
分类号 G01N37/00;B82B3/00;C23C16/04;C23C16/48;C23F4/00;G01Q60/18;G01Q60/22;G01Q80/00;H01L21/205;(IPC1-7):C23C16/04;G01N13/14 主分类号 G01N37/00
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