METHOD AND APPARATUS FOR PRODUCING THERMAL HEAD MATERIAL

摘要

PROBLEM TO BE SOLVED: To allow even a substrate becoming insufficient in attraction by a degree of vacuum attraction force to be certainly attracted to a rotary attraction stand and to certainly perform the forming work of a resist film on the substrate performed at this time. SOLUTION: A substrate having magnetism is set to the recessed part 18 formed to the upper surface of an attraction stand 13 comprising a magnet and, after a resist is dripped on the surface of the substrate, the substrate is rotated along with the attraction stand 13 to spread the resist and the substrate having the resist film formed on the surface thereof is obtained as a thermal head material. The substrate is certainly attracted to the attraction stand 13 by magnetic force to be prevented from flying out of the recessed part 18 to certainly form the resist film.