| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate washer whose size in the up-and-down direction can be made small. SOLUTION: A substrate treating device 1 is provided with a treating tank 11 for subjecting a substrate W to washing treatment by pure water stored therein, a pure water feeding path 13 for feeding deionized water into the treating tank 11 through feeding nozzles 12, a discharge port 14 for quickly discharging the pure water stored in the treating tank 11, a pair of cover members 15 arranged above the treating tank 11, a pure water feeding path 16 for feeding pure water to the substrate W through pure water nozzles arranged on the cover members 15, and a gaseous nitrogen feeding path 17 for feeding gaseous nitrogen into the treating tank 11 through gaseous nitrogen nozzles arranged on the cover members 15.
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