发明名称 POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a polishing device to prevent the occurrence of self-excited vibration due to a stick slip occurring between a substance to be polished and polishing cloth and prevent application of vibration and noise on a periphery. SOLUTION: A polishing device comprises a turn table 10 having an upper surface on which polishing cloth 12 is applied; and a top ring 20. The surface to be polished of a substance 26 to be polished mounted on the top ring 20 is brought into contact with the polishing cloth 12 surface of the turn table 10, and the turn table 10 and the top ring 20 are mutually rotated. In a so formed polishing device to polish a substance 26 to be polished, and the rotary shaft 21 of the top ring 20 is rotatably supported by a mechanical type radial bearing. Electromagnets 1 and 2 are arranged in the vertical direction of the rotary shaft 21 with a given distance therebetween. Acceleration sensors 3 and 4 to detect vibration of the rotary shaft 21 are provided. Through feedback of signals from the acceleration sensors 3 and 4 to the electromagnet through a controller, vibration of the top ring is damped.
申请公布号 JP2000000756(A) 申请公布日期 2000.01.07
申请号 JP19980168287 申请日期 1998.06.16
申请人 EBARA CORP 发明人 WATANABE KAZUHIDE
分类号 B24B37/10 主分类号 B24B37/10
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