| 摘要 |
PROBLEM TO BE SOLVED: To satisfy requirement for an exposure system with the wavelength of <=19 nm in an EUV region, by forming and arranging a raster element of a mirror or a lens so that the image of the raster element agrees at the most part of a reticle surface and an output pupil is illuminated. SOLUTION: This is the principle diagram of the beam path of the system having two honeycomb plates. The light from a light source 1 is condensed by a condenser lens 3 of a light source 1 and converted into a parallel-light pensile or a convergent optical pensile. A field honeycomb 5 of the first honeycomb plate 7 disassembles this optical pensile, and the secondary light source is generated at the place of a pupile honeycomb 9. A field lens 12 forms the images of these secondary light sources to the outputting pupil of the lighting system or the input pupil of an objective lens. The device such as this provides the field surface to the input pupil of the objective lens from the light source and the beam path wherein the pupil surfaces are mutually linked. |
