| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern information measuring device and measuring method capable of measuring a pattern position only by scanning one time a spot light condensed at a plurality of known intervals or substrates in one of X or Y directions. SOLUTION: Provided are a irradiation part irradiating a plurality of spot lights 10 and the like in mutually specific position relation on a substrate 13 to be measured, a scanning part 14 simultaneously scanning a plurality of spot lights 10 on the substrate 13 to be measured, a light receiving part 17a and the like receiving the reflection light generated at the pattern on the substrate 13 to be measured, and an operation processing part calculating the information of the pattern based on the output form the light receiving part 17a. The pattern on the substrate 13 to be measured is simultaneously scanned by a plurality of spot lights. Therefore, by scanning once without scanning a plurality of times, through-put is improved and device operation is simplified.
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