| 摘要 |
PROBLEM TO BE SOLVED: To easily and speedily clean a vessel and to improve the efficiency of CVD operation by coating a substrate with a carbon thin film by an ECR plasma CVD method, discharging the substrate, then introducing a cleaning gas into the vessel thereby generating plasma. SOLUTION: Into an evacuated CVD vessel 1, a microwave 3 is introduced from a microwave introducing window 1a, and, furthermore, the magnetic field is applied thereto by a coil 2. In this way, a gaseous starting material such as CH4 introduced from a gaseous starting material introducing tube 6 is made into ECR plasma. In this plasma, the gaseous starting material is decomposed, is drawn out from a plasma generating chamber 1d and is allowed to collide against a substrate 5 to deposit C and to coat the substrate 5 with a carbon thin film, which is discharged via a pressure controlling vessel 9 by using a handle 11. After that, a cleaning gas such as gaseous N2 is introduced from a cleaning gas introducing tube 7 to generate plasma therein. By this plasma of the gas, the inside of the CVD vessel, particularly the microwave introducing window 1a is cleaned.
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