DISCHARGE ELECTRODE AND HIGH FREQUENCY PLASMA GENERATOR USING THE SAME, AND FEEDING METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a plasma depositing device which can form an amorphous thin film or a fine crystal thin film with a uniform thickness and provide a high frequency discharge electrode used in the plasma deposition device. SOLUTION: A plurality of electrode rods 12a are arranged in parallel with each other, and both ends of the rods 12a are connected to each other with electrode rods 12b and 12c to form a ladder-shaped high frequency discharge electrode 11. Feeding points 13 (13-1 to 13-4) are arranged at predetermined positions which are symmetrical with respect to a reference line 14, which is a bisector of one side of the ladder-shaped electrode 11. With this constitution, voltage variations on the ladder-shaped electrode which has effects on the uniformity of a discharge distribution can be suppressed sufficiently and a uniform film forming speed distribution can be obtained, so that uniform deposition can be realized, even if the area of the deposition becomes vary large.