| 摘要 |
PROBLEM TO BE SOLVED: To enhance the sensitivity of an org. polysilane for photolytic reaction and to shorten the exposure time by incorporating a silver colloid which absorbs light in a visible ray region into a photosensitive resin compsn. SOLUTION: This photosensitive compsn. contains a polysilane having >=10,000 weight average mol.wt. and silver colloid having 1 to 30 nm particle size. As for the polysilane, network or chain-like polysilane or a mixture of these can be used, and the network-like polysilane is most preferable considering the mechanical strength of the photosensitive material. The silver colloid consists of silver colloid particles having 1 to 30 nm particle size and has absorption of light in a UV ray to visible ray region by the color developing mechanism called as plasmon absorption caused by the plasma oscillation of electrons. As for the method to produce the silver colloid, a method to chemically reduce silver ion in a soln. (in-liquid reducing method) is preferable because fine silver colloid particles can be easily and efficiently produced from an easily available silver compd. |
