| 摘要 |
PROBLEM TO BE SOLVED: To improve exposure accuracy such as overlapping accuracy of, e.g. connecting parts, by providing a first interferometer system, which measures the position information of the first holding means in the crossing direction with the direction of synchronous movement during scanning exposure. SOLUTION: At first, under the state wherein an illuminating region 20 on a reticle 19 is illuminated by a pulse laser 1L, the reticle 19 is scanned in the -X direction through a driving device 26 and a reticle stage 21. Furthermore, a wafer 28 is scanned in the X direction through a driving device 33 and a wafer stage 30. Furthermore, when the reticle 19 and the wafer 28 are scanned, the difference between the measured value of a laser interferometer 24 when, e.g. the alignment mark on the reticle 10 and the alignment mark on the wafer agree and the value, which is obtained by multiplying the measured value of a laser interferometer 32 by projection multiplying factor, is memorized as the reference value. The operation of the driving devices 26 and 33 are controlled so that the difference between the measured value of the laser interferometer 24, and the value which is obtained by multiplying the projection multiplying factor on the measured value of the laser interferometer 32 becomes the reference value memorized before. |
