发明名称 VAPOR DEPOSITION APPARATUS FOR GENERATING TRIGGER DISCHARGE BY USING TRANSFORMER
摘要 <p>PROBLEM TO BE SOLVED: To provide a higher-purity thin film by using a coaxial type vacuum arc vapor deposition source. SOLUTION: This vapor deposition apparatus 10 is so constituted that an arc discharge is induced by a trigger discharge and the material constituting a material 43 for vapor deposition is released in a large amt. into a vacuum vessel 1, by which the thin film is formed. A trigger power source 20 for generating the trigger discharge has a pulse power source 21 and a transformer 22. The pulse voltage formed by this pulse power source 21 is impressed to the primary winding 22a in this transformer 22. The amplified pulse voltage is outputted from the secondary winding 22b and is impressed to a trigger electrode 42. There is thus no capacitor in a route where the trigger current flows and a resonance circuit is not formed in the vapor deposition apparatus 10. Then, the AC current does not flow to the trigger electrode and the intrusion of the material constituting the trigger electrode in the form of an impurity into the thin film does not occur.</p>
申请公布号 JP2000001770(A) 申请公布日期 2000.01.07
申请号 JP19980171942 申请日期 1998.06.18
申请人 ULVAC CORP;NICHICON CORP 发明人 AGAWA YOSHIAKI;YAMAMOTO YOSHIHIRO
分类号 H05B7/144;C23C14/24;(IPC1-7):C23C14/24 主分类号 H05B7/144
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