| 摘要 |
PROBLEM TO BE SOLVED: To correctly control a temperature of a silicon work piece and correctly control a temperature-dependent process in a wide range of a process temperature by measuring the temperature on the basis of a spectral characteristic of a reflecting ultraviolet light. SOLUTION: A temperature-measuring apparatus 9 at an apparatus 39 for processing silicon work pieces is provided with a light source 11 such as a deuterium lamp or the like which irradiates ultraviolet light beams to a silicon surface 10a of a work piece 10 via a polarizer 13 such as a linear polarizer or the like, and a spectrum analysis apparatus 15 comprised of, e.g. a diffuse element 16 and a photodetector array 17. A beam 12 is irradiated to the silicon surface 10a by an angle of approximately 45-85 deg. and the reflecting light is spectrally analyzed after passing a polarizer 14 set at right angles to the polarizer 13. The obtained data is analyzed according to a predetermined system by a computer 44, whereby, for example, a temperature information for controlling a temperature-dependent process apparatus such as a vapor deposition apparatus 43, etc., with the use of a heating element 42 is provided.
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