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发明名称
MULTIPLE VAPORIZER REAGENT SUPPLY SYSTEM FOR CHEMICAL VAPOR DEPOSITION UTILIZING DISSIMILAR PRECURSOR COMPOSITIONS
摘要
申请公布号
EP0968319(A1)
申请公布日期
2000.01.05
申请号
EP19970950702
申请日期
1997.11.24
申请人
ADVANCED TECHNOLOGY MATERIALS, INC.
发明人
ROEDER, JEFFREY;VAN BUSKIRK, PETER, C.
分类号
C01G23/00;C01G25/00;C01G33/00;C23C16/40;C23C16/448;C23C16/455;(IPC1-7):C23C16/00
主分类号
C01G23/00
代理机构
代理人
主权项
地址
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