Cyclic dione polymers useful in thin-film coating composition, photoresist or blend

摘要

Cyclic dione (co)polymers (A) are based on a cyclic dione monomer, which is a 2H-pyran-, -thiopyran, -pyridin- or -phosphorin- or cyclohex-4-en- or silacyclohex-4-en-3,6-dione (I) or 1,3-dioxepin-4,7-dione (II). Cyclic dione (co)polymers (A) are based on a cyclic dione monomer, which is a 2H-pyran-, -thiopyran, -pyridin- or -phosphorin- or cyclohex-4-en- or silacyclohex-4-en-3,6-dione of formula (I) or 1,3-dioxepin-4,7-dione of formula (II). A, B = halogen, hydrogen (H), 3 - 20 C cyclic or pericyclic alkyl, 1-20 C linear or branched alkyl, 6 - 20 C aryl, 7 - 20 C arylalkyl, 7 - 20 C alkylaryl, silyl, alkylsilyl, germyl, alkylgermyl, alkoxycarbonyl, acyl or a heterocyclic group; or AB = a group forming a 3-20 C (un)saturated cyclic hydrocarbon or (un)substituted heterocyclic group; X = O, S or a group of the formula (a) - (d) ;-CH2- or -SIH2-; R<1> = 1-20 C alkyl or phenyl Independent claims are also included for (a) a thin film coating composition containing polymer (A); (b) a photosensitive composition containing polymer (A); and (c) a polymer blend containing polymer (A) and a different polymer.