Etching of Bi-based metal oxides ceramics

摘要

An etching solution comprising fluoride and nitric acid is employed to pattern or remove Bi-based oxide ceramics. The etching solution can be mixed with H2O to adjust the etch rate. Additionally, inorganic components can be included to increase or decrease the etch rate. Organic components can be included to regulate the wetting/adhesion properties of the etch chemistry.