发明名称 |
Method and apparatus for preparing a sample for optical analysis and method of controlling the apparatus |
摘要 |
A method for preparing a sample for its optical analysis in the manufacture of a semiconductor device includes the step of drying a liquid formed on the semiconductor wafer until the concentration of contaminants contained in the liquid is of a sufficiently high level for the optical analyzer to adequately detect the contaminants. The liquid may be of a film formed on the wafer and dissolved into liquid drops, or deionized water or various chemicals to which the wafer is exposed during a manufacturing process. The apparatus includes a chuck for bringing the wafer into and out of a processing chamber, a guide for guiding the chuck, a piston cylinder for driving the chuck along the guide to a processing position, and a gas supplying system which directs nitrogen gas onto the wafer for drying the liquid. Appropriate controls are provided so that the apparatus can be operated automatically or manually.
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申请公布号 |
US6010637(A) |
申请公布日期 |
2000.01.04 |
申请号 |
US19980034329 |
申请日期 |
1998.03.04 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, CHUN-DEUK;LEE, KYOUNG-SEOP;LEE, HYUN-WOON;LEE, JUNG-KEUN |
分类号 |
G01N1/28;G01N33/00;H01L21/66;(IPC1-7):C03C25/06 |
主分类号 |
G01N1/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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