| 摘要 |
PCT No. PCT/JP95/02114 Sec. 371 Date Apr. 11, 1997 Sec. 102(e) Date Apr. 11, 1997 PCT Filed Oct. 13, 1995 PCT Pub. No. WO96/12216 PCT Pub. Date Apr. 25, 1996The invention provides a resist composition comprising a polymer (a) having groups cleavable by an acid and a compound (b) which can form an acid upon exposure to active rays, wherein the polymer (a) is a polymer having, as the groups cleavable by an acid, groups containing a substituted allyloxy group having at least two substituents, and a resist composition comprising a resin binder (A), a compound (B) which can form an acid upon exposure to active rays, and a compound (C) having a group cleavable by an acid, wherein the compound (C) having the group cleavable by an acid is a compound having a group containing a substituted allyloxy group having at least one substituent. The resist compositions have excellent sensitivity, resolution and heat resistance and can provide excellent pattern form.
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