Negatively acting photoresist composition based on polyimide precursors

摘要

A negatively operating photoresist composition comprising: (a) a polyimide precursor containing repeating structural units of formula (1) the composition comprises in all as many structural units of formula (I), which have residues R2, that the composition can be developed by means of aqueous-alkaline developers for photoresists, which are free of organic solvents.