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发明名称
Plasmaerzeugungsverfahren und -gerät und Plasmabearbeitungsverfahren und -gerät
摘要
申请公布号
DE69421872(D1)
申请公布日期
2000.01.05
申请号
DE19946021872
申请日期
1994.09.16
申请人
HITACHI, LTD.
发明人
WATANABE, KATSUYA;KAJI, TETSUNORI;TAMURA, NAOYUKI;NAKATA, KENJI;SHICHIDA, HIROYUKI;WATANABE, SEIICHI;OKUDAIRA, SADAYUKI;SUZUKI, KEIZO
分类号
H01J37/32;(IPC1-7):H01J37/32;H05H1/46
主分类号
H01J37/32
代理机构
代理人
主权项
地址
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