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发明名称
IR-and UV-radiation-sensitive composition and lithographic plate
摘要
<p>본 발명의 IR 및 UV 조사광 감광 조성물은 디아조(diazo) 수지, 디아조 에스테르(diazo ester), 적어도 하나의 노볼락(novolac) 수지 및 IR광 흡수제를 포함한다. 리토그라피 판은 상기 감광 조성물로 도포된 지지대를 포함한다.</p>
申请公布号
KR19990088227(A)
申请公布日期
1999.12.27
申请号
KR19990016957
申请日期
1999.05.12
申请人
null, null
发明人
볼리안젤로;페베리파올로;테타만티안드레아
分类号
G03F7/039;B41C1/10;B41M5/36;G03F7/00;G03F7/004;G03F7/022;G03F7/023
主分类号
G03F7/039
代理机构
代理人
主权项
地址
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