| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a heater for heating a wafer in which the uniformity of the temperature distribution of a wafer can be made excellent, and costs required for manufacture and maintenance can be reduced. SOLUTION: A heater is composed of 8 heater units 11-18 equipped with the same rectangular plane shape. The four heater units 15-18 are arranged at positions corresponding to each circular arc obtained by equally dividing an outside dimension line 7 of a wafer 1 in a circumferential direction so that the longitudinal line of the rectangular shape can be made vertical to the diameter direction of the wafer 1. The other four heat units 11-14 are arranged between the heater units 15 and 16 positioned so as to be separated from each other at 180 deg. in the circumferential direction among the four heater units 15-18 so as to be aligned with equal intervals in parallel with those heater units 15 and 16. Those 8 heater units 11-18 are feedback-controlled independently (or after combined by every several units).</p> |
