| 摘要 |
PROBLEM TO BE SOLVED: To enable the extremely fine processing of the submicron sizes of not only the magnetic pole front end of bisected upper electrodes but the upper magnetic pole layer as well. SOLUTION: The upper magnetic pole is bisected to the magnetic pole front end 20 and the upper magnetic pole layer 25. The magnetic pole front end 20 is formed via a recording gap layer 19 on the plane surface on the lower magnetic pole 18. As a result, the magnetic pole front end regulating a recording track width is processed to the submicron size. An insulating layer 21a is formed in a region adjacent to the magnetic pole front end 20. A first layer of a thin- film coil 22 is formed within the region where the insulating layer 21a is formed. The thin-film coil 22 is covered by the insulating layer 21b flattened on the surface. As a result, the difference in level of the apex part inclusive of the thin-film coil 23 is made lower than the conventional structure by as much as the thin-film coil 22. Then, the influence of the difference in level of the apex part is reduced at the time of forming the upper magnetic pole layer 25 by photolithography and eventually the submicron size of the upper magnetic pole layer 25 may be made finer. |
