| 摘要 |
PROBLEM TO BE SOLVED: To allow rim exposure with a substrate, without increasing the number of processes. SOLUTION: A cooling/exposure processing part CP2 comprises a cool plate 14 which supports a substrate W through three balls 15 provided on its surface, a motor which rotates the cooling plate 14 around an axis in vertical direction, and a light projecting mechanism 20 which projects light to the peripheral part of the substrate W rotated while being placed on the cool plate 14 from above. The substrate W transferred to the cooling/exposure processing part CP2 is placed on the cooling plate 14 for cooling process. In addition, the light emitted from the light projecting mechanism 20 is projected towards the peripheral part of the substrate W. In a condition such that the substrate W is rotated together with the cool plate 14 and the entire peripheral part of the substrate W is irradiated with the light. |
