发明名称 METHOD FOR PROCESSING COMPREMENTARY MOS COLOR FILTER
摘要 <p>PROBLEM TO BE SOLVED: To completely remove a color filter film by, after a first plasma process is performed for solvent process which softens a color film, performing a second oxygen plasma process for removing a remaining part of the color filter film. SOLUTION: Related to a re-process, for example, a patterning process 40 for a color filter film is performed first. Then, a thermal process 42 such as solidifying process may be performed on the color filter film. The thermal process 42 is a pre-baking process for raising the density of the color filter film. Then an oxygen plasma process 44 is performed to remove the most part of the color filter film. After that, a remaining color filter film is softened in a solvent process 446. Further, another oxygen plasma process 48 is performed to remove the remaining color filter film. Thus, the color filter film is entirely removed.</p>
申请公布号 JPH11354770(A) 申请公布日期 1999.12.24
申请号 JP19980216071 申请日期 1998.07.30
申请人 UNITED MICROELECTRONICS CORP 发明人 HAKU GENKICHI;TEI KAJIN;RIN IKYO
分类号 G02B5/20;H01L27/14;(IPC1-7):H01L27/14 主分类号 G02B5/20
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