发明名称 REFLECTION REDUCING MATERIAL AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To enhance the surface hardness and to obtain light transmittance and a low reflectance by forming an antireflection film on a substrate by coating it with respectively specific fluorine-contg. di(meth) acrylic ester, its polymer and a fluorine-contg. curable coating soln. SOLUTION: The antireflection film is formed on one face or both faces of a substrate by coating it with a fluorine-contg. curable coating soln. contg. a photopolymerization initiator, fluorine-contg. di(meth)acrylic ester represented by formula I and a polymer contg. fluorine-contg. (meth)acrylic ester represented by formula II as constituent units by >=50 wt.%. In the formula I, X<1> and X<2> are each H or methyl group and Y<1> is a 1-14C fluoroalkylene group having >=2 F atoms or the like. In the formula II, X<3> is H or a methyl group and Y<3> is a 2-14C fluoroalkyl group having >=3 F atoms or a 4-14C fluorocycloalkyl group having >=4 F atoms.
申请公布号 JPH11352306(A) 申请公布日期 1999.12.24
申请号 JP19990055361 申请日期 1999.03.03
申请人 NOF CORP 发明人 MORIMOTO YOSHIHIRO;ITO TETSUYA;WATANABE KENJI
分类号 C09D133/16;C08F220/22;G02B1/11 主分类号 C09D133/16
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