| 摘要 |
PROBLEM TO BE SOLVED: To measure synchronization accuracy between the mask of a scanning exposure device and a substrate, based on a transfer image which is transferred onto the substrate. SOLUTION: A first wedge-like pattern P1, with its longitudinal direction almost in the scanning direction and a second wedge-like pattern P2 with its longitudinal direction almost orthogonal to the scanning direction, are scan- exposed on a substrate which is scanned in synchronous with a mask. By having the length of the wedge-like pattern transferred onto the substrate measured, a synchronization accuracy is obtained. |
