发明名称 |
TARGET MATERIAL FOR SPATTERING |
摘要 |
A target for spattering comprising a noble metal, characterized in that it has a columnar crystal texture which grows in the normal direction to a spattering plane. The target is free from the occurrence of the problem that a fine block in a cluster form is missed from a target, which problem is likely to occur in a target for spattering obtained by using the dissolution casting method or the powder metallurgy method, and can be used for producing a thin film having good film properties, and further is a high purity noble metal target for spattering having little internal defect.
|
申请公布号 |
WO9966099(A1) |
申请公布日期 |
1999.12.23 |
申请号 |
WO1999JP03194 |
申请日期 |
1999.06.16 |
申请人 |
TANAKA KIKINZOKU KOGYO K.K.;HARA, NORIAKI;YARITA, SOMEI;HAGIWARA, KEN;MATSUZAKA, RITSUYA |
发明人 |
HARA, NORIAKI;YARITA, SOMEI;HAGIWARA, KEN;MATSUZAKA, RITSUYA |
分类号 |
C23C14/34;(IPC1-7):C23C14/34;H01L21/285 |
主分类号 |
C23C14/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|