Photographic mask material and mask, useful in printed circuit and liquid crystal display manufacture

摘要

Photographic mask material has a transparent glass substrate with a layer containing physical development nuclei covered by a light-sensitive layer containing silver halide. Independent claims are also included for: (a) a method of making the mask material by coating the substrate with a liquid containing physical development nuclei and then with a silver halide emulsion; (b) photomasks with a light-screening silver pattern formed by the action of the physical development nuclei on the silver halide during processing; and (c) a method of making a photomask by selective exposure of the light-sensitive layer of the mask material to form a latent image nucleus in the silver halide in the exposed area; followed by reduction and removal of the silver halide in the unexposed area to form a silver film of predetermined pattern on the first layer by the action of the physical development nuclei; and removal of the light-sensitive layer.