| 摘要 |
<p>To find the positional relationship between the reference coordinate system XY defining the movement of a wafer (W) and the arrangement coordinate system αβ according to the arrangement of demarcated regions (CA) demarcated by street lines (Sα, Sβ) on the wafer (W), the wafer (W) and the observation visual field are relatively moved. By allowing position sensing marks (Mk) on the wafer (W) to visit the observation visual field, the street lines (Sα, Sβ) are detected in the observation visual field during the relative movement. According to the results of the detection, approximated arrangement coordinates are corrected. The positional relationship between the reference coordinate system XY and the arrangement coordinate system αβ is found with a precision high enough to allow the observation visual field to visit the position sensing mark (Mk). Thus, by quickly determining the arrangement coordinates of the demarcated regions with good precision, high precision exposure can be performed with improved throughput.</p> |
