发明名称 Semiconductor integrated circuit device
摘要 In an integrated circuit device using a plurality of different power supply voltages, the application of an input voltage exceeding the power supply voltages to an input/output circuit is prevented. When a p-type substrate is used, a plurality n-wells are formed to surround an integrated circuit region on a central portion of the substrate. When an n-type substrate is used, a plurality of p-wells are formed in the same manner. A predetermined power supply voltage is applied to each well to select transistors of the input/output buffer in accordance with the voltage level of an external voltage. <IMAGE>
申请公布号 EP0563921(B1) 申请公布日期 1999.12.22
申请号 EP19930105341 申请日期 1993.03.31
申请人 KABUSHIKI KAISHA TOSHIBA;TOSHIBA MICRO-ELECTRONICS CORPORATION 发明人 SAKAI, IZUMI, C/O INTELLECTUAL PROPERTY DIVISION;UCHINO, YUKINORI, C/O INTELLECTUAL PROPERTY DIV.;TANAKA, YASUNORI, C/O INTELLECTUAL PROPERTY DIV.;MORI, TOSHIAKI, C/O INTELLECTUAL PROPERTY DIV.
分类号 H01L21/8238;H01L21/822;H01L27/02;H01L27/04;H01L27/092;H01L27/118 主分类号 H01L21/8238
代理机构 代理人
主权项
地址