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发明名称
Method of fabricating semiconductor thin film and method of fabricating hall-effect device
摘要
申请公布号
EP0632485(B1)
申请公布日期
1999.12.22
申请号
EP19940108235
申请日期
1994.05.27
申请人
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人
KAWASAKI, TETUO;KORETIKA, TETUHIRO;KITABATAKE, MAKOTO;HIRAO, TAKASHI
分类号
H01L21/20;H01L43/06;H01L43/08;(IPC1-7):H01L21/20;H01L43/14
主分类号
H01L21/20
代理机构
代理人
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