| 摘要 |
A layout is provided for an SRAM structure. The layout includes a first storage transistor cross-coupled to a second storage transistor to form an SRAM cell. The source regions of the first and second storage transistors are formed in a common region in the substrate to provide a more compact and dense array. The memory cell also includes a first access transistor and a second access transistor appropriately coupled to the appropriate data storage notes. The gate electrodes for the storage transistors and the access transistors are substantially parallel to each other thus providing advantages in operational characteristics and layout efficiencies. The channel regions are also exactly perpendicular to the gate electrodes and are parallel to each other for each of their respective transistors, thereby obtaining similar benefits. The memory cell is designed having a low aspect ratio, preferably lower than 1.2. A single metal line has two contacts to the common source region to ensure grounding of the memory cell at all times and the removal of any stray and parasitic currents which may occur from time to time. The same metal source line is also connected to the P well to ensure that the source region and P well are held at the same voltage at all times and to prevent P well bounce.
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