发明名称 Micro control valve and apparatus and method for making semiconductors with high purity process gas
摘要 An improved continuously variable micro control valve and an apparatus and a method employing the same for making semiconductors enable a computer to precisely set a driver of the micro control valve such that the accuracy of the control valve in reproducing a flow value for a given setting of the driver is at least +E,fra 1/1000+EE of a maximum flow value for a relatively wide range of flow values which can be provided by the micro control valve. The relatively wide range of flow values is at least 1000 to 1 in a disclosed embodiment with a resolution sensitivity of the micro control valve being at least +E,fra 1/10,000+EE of the full scale of the relatively wide range of flow values. The improvement in repeatability and accuracy afforded by the micro control valve can result in higher yields in semiconductor making.
申请公布号 US6003535(A) 申请公布日期 1999.12.21
申请号 US19960646140 申请日期 1996.05.07
申请人 VERIFLO CORPORATION 发明人 OLLIVIER, LOUIS A.
分类号 F16K31/04;F16K41/10;(IPC1-7):F16K31/04;F16K1/02 主分类号 F16K31/04
代理机构 代理人
主权项
地址