发明名称 ALUMINA DISPERSED POLISHING LIQUID AND PRODUCTION OF ALUMINA DISPERSED POLISHING LIQUID
摘要 PROBLEM TO BE SOLVED: To obtain the subject polishing liquid capable of avoiding trouble caused by thickening when dispersing alumina, the gelation, sedimentation, aggregation, etc., after the dispersion by including a nitrogen-containing monocarboxylic acid and a fine alumina dispersed in an aqueous dispersion medium and regulating the pH. SOLUTION: This polishing liquid is obtained by including a nitrogen- containing monocarboxylic acid (preferably nicotinic acid or glycine) and an alumina dispersed in an aqueous dispersion medium and having 5-100 nm average primary particle diameter (preferably the one selected fromα-,θ-,γ- andδ-alumina) and regulating the pH to 3-6. The amount of the compounded alumina in the objective polishing liquid is preferably 15-50 wt.%. The nitrogen-containing monocarboxylic acid is preferably compounded in an amount of 1-5 pts.wt. based on 100 pts.wt. of the alumina. The objective polishing liquid is preferably prepared by adding the monocarboxylic acid into the aqueous dispersion medium, then regulating the aqueous medium to a weak acidic state and dispersing the alumina in the aqueous dispersion medium.
申请公布号 JPH11349926(A) 申请公布日期 1999.12.21
申请号 JP19980157909 申请日期 1998.06.05
申请人 TAIHO IND CO LTD 发明人 KAWADA KENJI;OKURA HIROSUKE;OCHIAI TETSUYA
分类号 C09K3/14;(IPC1-7):C09K3/14 主分类号 C09K3/14
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