发明名称 TEOS-O3 oxidizing film depositing system and process for supplying ozone (O3) thereto
摘要 A method and apparatus for controlling the amount of ozone concentration in the layers of a film depositing system and the multi-layered structure produced thereby, whereby the concentration of ozone in each layer gradually changes from a low ozone concentration in the first deposited layer to a high ozone concentration in the last deposited layer.
申请公布号 US6004397(A) 申请公布日期 1999.12.21
申请号 US19990238067 申请日期 1999.01.27
申请人 LG SEMICON CO., LTD. 发明人 PARK, NAE-HAK;KIM, YUN-HEE;SONG, YOUNG-JIN
分类号 H01L21/316;(IPC1-7):C23C16/00 主分类号 H01L21/316
代理机构 代理人
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