发明名称 |
TEOS-O3 oxidizing film depositing system and process for supplying ozone (O3) thereto |
摘要 |
A method and apparatus for controlling the amount of ozone concentration in the layers of a film depositing system and the multi-layered structure produced thereby, whereby the concentration of ozone in each layer gradually changes from a low ozone concentration in the first deposited layer to a high ozone concentration in the last deposited layer.
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申请公布号 |
US6004397(A) |
申请公布日期 |
1999.12.21 |
申请号 |
US19990238067 |
申请日期 |
1999.01.27 |
申请人 |
LG SEMICON CO., LTD. |
发明人 |
PARK, NAE-HAK;KIM, YUN-HEE;SONG, YOUNG-JIN |
分类号 |
H01L21/316;(IPC1-7):C23C16/00 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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