发明名称 ABRASIVE METHOD FOR SILICON WAFER
摘要 PROBLEM TO BE SOLVED: To effect the abrasion at a level where no copper is substantially left by providing a grinding slurry supply pipe whose inner surface is coated with a resin or formed of a resin, and providing various members of a grinding device which are coated with a resin or formed of a resin. SOLUTION: In a carrying robot to be used in carrying a silicon wafer 4, a hand part is coated with a resin, and a pipe 7 to supply a slurry 2 is formed of a resin or coated with a resin on its inner surface. Both a hub and a plate 1 forming major members of a grinding device are coated with a resin, and all dressing brushes of an abrasive cloth 5 are formed of a resin. Both a storage tank and a feed pump for the slurry 2 are coated with a resin. Both the abrasive cloth 5 and a wax 3 are free from copper. The residual copper content on the silicon wafer 4 is substantially zero thereby.
申请公布号 JPH11347921(A) 申请公布日期 1999.12.21
申请号 JP19980157964 申请日期 1998.06.05
申请人 MEMC KK 发明人 INABA AKIHIRO;KOMURA TOMOYOSHI
分类号 B24B37/00;B24B41/02;B24B53/007;B24D13/10;H01L21/304 主分类号 B24B37/00
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