发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To prevent the droplets of treating liquid adherent to the lower surface of a lid member provided in a substrate treatment apparatus from scattering. SOLUTION: An outward opening/closing members 14a and 14b are installed above a treatment tank 10 for storing a treating liquid for immersing a substrate W, and lower surfaces of the members 14a and 14b are slanted. Grooves 26 are formed at positions of the slanted lower surfaces above an overflow tank 13. The droplets P of the treating liquid adherent to the lower surfaces of the members 14a and 14b flow down on the slanted lower surfaces and fall from the positions of the grooves 26 to be collected in the over flow tank 13. Since the droplets P do not remain on the lower surfaces, the scattering of the droplets P is prevented when the opening/closing members 14a and 14b are opened/closed.</p>
申请公布号 JPH11347501(A) 申请公布日期 1999.12.21
申请号 JP19980163537 申请日期 1998.06.11
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YASUFUKU KOJI;OSAKI TOSHIYUKI
分类号 B08B3/04;H01L21/304;H01L21/673;H01L21/68;(IPC1-7):B08B3/04 主分类号 B08B3/04
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