发明名称 CHUCK APPARATUS FOR CLAMPING A PLANAR SUBSTRATE IN AN ELECTROSTATIC COATING METHOD
摘要 <p>The disclosure relates to an apparatus for electrostatically adhering grains to a planar substrate comprising: a) an electrostatic chuck (10) having a collection surface with at least one grain collection zone for electrostatically directing charged grains to a corresponding surface on the planar substrate; and b) a pattern of holes through the electrostatic chuck (10) allowing a source of vacuum (15) to act through the chuck (10) to adhere the planar substrate.</p>
申请公布号 WO1999065136(A1) 申请公布日期 1999.12.16
申请号 US1999012632 申请日期 1999.06.08
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