发明名称 |
Vorrichtung zur Formung eines Elektronenstrahls, Verfahren zur Herstellung der Vorrichtung und Anwendung |
摘要 |
The invention relates to an extremely low-capacitance device for forming an electron beam. The device is based on a ceramic body having a monolithic multilayer structure. The ceramic body is produced using LTCC technology, whereby said method is modified in a targeted manner. The body is made of presintered ceramic layers, whose lateral shrinkage is suppressed. The through holes of the electrodes for the electron beam are thus exactly arranged coaxially and tolerances for the dimensions of the electrodes are decoupled from shrinkage during sintering. Such a device makes it possible to focus the electron beam of an electron gun and modulate its intensity.
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申请公布号 |
DE19824783(A1) |
申请公布日期 |
1999.12.16 |
申请号 |
DE19981024783 |
申请日期 |
1998.06.03 |
申请人 |
SIEMENS AG |
发明人 |
BURKHARDT, KLAUS;ECKHARDT, WOLFGANG;GOHLKE, SILVIA;MAENNER, RUTH;WERSING, WOLFRAM |
分类号 |
H01J3/02;H01J9/18;H01J37/12;(IPC1-7):H01J37/12;H01J9/02;H01J37/04;H01J37/09;H01J37/153 |
主分类号 |
H01J3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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