发明名称 Vorrichtung zur Formung eines Elektronenstrahls, Verfahren zur Herstellung der Vorrichtung und Anwendung
摘要 The invention relates to an extremely low-capacitance device for forming an electron beam. The device is based on a ceramic body having a monolithic multilayer structure. The ceramic body is produced using LTCC technology, whereby said method is modified in a targeted manner. The body is made of presintered ceramic layers, whose lateral shrinkage is suppressed. The through holes of the electrodes for the electron beam are thus exactly arranged coaxially and tolerances for the dimensions of the electrodes are decoupled from shrinkage during sintering. Such a device makes it possible to focus the electron beam of an electron gun and modulate its intensity.
申请公布号 DE19824783(A1) 申请公布日期 1999.12.16
申请号 DE19981024783 申请日期 1998.06.03
申请人 SIEMENS AG 发明人 BURKHARDT, KLAUS;ECKHARDT, WOLFGANG;GOHLKE, SILVIA;MAENNER, RUTH;WERSING, WOLFRAM
分类号 H01J3/02;H01J9/18;H01J37/12;(IPC1-7):H01J37/12;H01J9/02;H01J37/04;H01J37/09;H01J37/153 主分类号 H01J3/02
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